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DFT Simulations of Inter-Graphene-Layer Coupling with Rotationally Misaligned hBN Tunnel Barriers in Graphene/hBN/Graphene Tunnel FETs

机译:用旋转法研究石墨烯层间耦合的DFT模拟   石墨烯/ hBN /石墨烯隧道FET中未对准的hBN隧道势垒

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摘要

Van der Waal's heterostrucutures allow for novel devices such astwo-dimensional-to-two-dimensional tunnel devices, exemplified by interlayertunnel FETs. These devices employ channel/tunnel-barrier/channel geometries.However, during layer-by-layer exfoliation of these multi-layer materials,rotational misalignment is the norm and may substantially affect devicecharacteristics. In this work, by using density functional theory methods, weconsider a reduction in tunneling due to weakened coupling across therotationally misaligned interface between the channel layers and the tunnelbarrier. As a prototypical system, we simulate the effects of rotationalmisalignment of the tunnel barrier layer between aligned channel layers in agraphene/hBN/graphene system. We find that rotational misalignment between thechannel layers and the tunnel barrier in this van der Waal's heterostructurecan significantly reduce coupling between the channels by reducing,specifically, coupling across the interface between the channels and the tunnelbarrier. This weakened coupling in graphene/hBN/graphene with hBN misalignmentmay be relevant to all such van der Waal's heterostructures.
机译:范德华(Van der Waal)的异质结构允许使用新颖的器件,例如二维至二维隧道器件,例如层间隧道FET。这些设备采用通道/隧道屏障/通道几何形状。但是,在这些多层材料的逐层剥落过程中,旋转未对准是正常现象,可能会严重影响设备特性。在这项工作中,通过使用密度泛函理论方法,我们考虑到由于通道层与隧道势垒之间的旋转未对准界面上的耦合减弱而导致的隧穿减少。作为一个原型系统,我们模拟了石墨烯/ hBN /石墨烯系统中对准的沟道层之间隧道势垒层旋转不对准的影响。我们发现,在该范德华异质结构中,通道层与隧道势垒之间的旋转不对准可通过减少(具体而言)减少通道与隧道势垒之间的界面耦合来显着减少通道之间的耦合。石墨烯/ hBN /石墨烯中的这种弱耦合与hBN错位可能与所有此类范德华异质结构有关。

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